Plasma Absorption Probe Measurement of Electron Density of Processing Plasmas.
نویسندگان
چکیده
منابع مشابه
Measurement of electron temperatures of Argon Plasmas in a High-Density Inductively-Coupled Remote Plasma System by Langmuir Probe and Optical-Emission Spectroscopy
We measured electron density and electron energy distribution function (EEDF) in our reactor by a Langmuir probe. The EEDF of Ar plasma in the reactor could largely be described by the Maxwell-Boltzmann distribution function, but it also contained a fraction (~10) of electrons which were much faster (20-40 eV). The peak of the fast-electron tail shifted from E ~ 35 eV at 11 μbar to E ~ 25 eV wh...
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ژورنال
عنوان ژورنال: Journal of Plasma and Fusion Research
سال: 2002
ISSN: 0918-7928
DOI: 10.1585/jspf.78.998